Thomas W. Smith

College of Art and Design College of Engineering Technology College of Health Sciences and Technology College of Liberal Arts College of Science Golisano College of Computing and Information Sciences International Campuses Kate Gleason College of Engineering National Technical Institute for the Deaf School of Individualized Study

Thomas W. Smith

Professor
College of Science
Chester F. Carlson Center for Imaging Science
School of Chemistry and Materials Science

2013 Submissions

Journal Paper

Smith, Thomas W. "Imidazole Polymers Derived from Ionic Liquid 4-Vinylimidazolium Monomers: Their Synthesis and Thermal and Dielectric Properties." Molecules ASAP. ma300862t (2013) Print. *

Published Conference Proceedings

Smith, Thomas W. "PVDF-based Polymer Blend Films for Fuel Cell Membranes." Proceedings of the MRS. Boston, Massachusetts: n.p., 2013. Print. *

2012 Submissions

Journal Paper

Smith, Thomas W. "Bis(trifluoromethyl)carbinol polynorbornene as a pseudo-polyelectrolyte in multilayered films." Thin Solid Films 520. (2012): 6170-6173. Print. *

Smith, Thomas W, et al. "Bis(trifluoromethyl)carbinol Polynorbornene as a Pseudo-Polyelectrolyte in Multilayered Films." Thin Solid Films 520. (2012): 6170-6173. Web.

Published Conference Proceedings

Smith, Thomas, et al. "PVDF-Based Polymer Blend Films for Fuel Cell Membranes." Proceedings of the Materials Research Society Symposium. Ed. Materials Research Society. Warrendale, PA: n.p., 2012. Print.

2010 Submissions

Published Article

Ince-Gunduz, Seyhan B., J. Pan, R. Nawrocki Jr., C. Sloan, A. Speranza, J. Wilson, T.W. Smith, P. Cebe. “Characterization of polymer blends for proton exchange membranes.” PMSE Preprints, (2010): n.p. Print. "  É 

Yin, Ran, B. Baylav, M. Zhao, P. Xie, B. Smith, T.W. Smith, “Synthesis of non-chemically amplified 193 nm photoresists based on copolymers containing formyloxybenzene functional groups.” Polymer Preprints, 51.1 (2010): 506. Print. "  É 

Baylav, Burak, M. Zhao, R. Yin, P. Xie, C. Scholz, B. Smith, T. Smith, P. Zimmerman. “Alternatives to Chemical Amplification for 193 nm Lithography.” Proceedings of SPIE Advances in Resist Materials and Processing Technology XXVII, 7639. Pt. 1 (2010): 15. Print. "  É  «