RIT IEEE EDS Event: 100 Years of the Field Effect Transistor (FET) “FET100”

Location

James E. Gleason Hall (GLE/009) - Gordon Atrium

In 2025, we will reach an important milestone: 100 years of the Field Effect Transistor (FET). The first concept of the FET was documented in a patent filed by Julius Lilienfeld on October 22, 1925 as a three terminal switching device. Over the past century, the development and innovations of the FET have been fundamental in enabling integrated circuits for computing, memory, communications, and countless other applications. The FET’s versatility and efficiency have made it a cornerstone of modern electronics, driving technological progress and shaping human history in profound ways. The Microelectronic Engineering Program shares 43% of this history. We propose to show an interactive display poster celebrating the 100th birthday of the FET, with demonstrations of RIT fabricated Metal Oxide Field Effect Transistors (MOSFETs) and contributions made by our students through their creative capstone projects and research.

Julius Edgar Lilienfeld files patent for FET in 1926

Design to Photolithography

Hand designing and contact printing was used 60 years ago. CAD to EUV.

Planar FET to Non Planar FET

Moving from micron to nm to Angstrom era

Location

James E. Gleason Hall (GLE/009) - Gordon Atrium

Topics

Exhibitor
Santosh Kurinec
Aravind Kolli
Rushi Jani
Gavin Anderberg

Advisor(s)
Four students will participate: Paul Jacob, Arvind Killi, Rushi Jani, Gavin Anderberg,

Organization
IEEE EDS

Exhibit Website


Thank you to all of our sponsors!