Welcome to the Nanolithography Research Labs at the Rochester Institute of Technology
Research presented here has been carried out by students in the College of Engineering and College of Science under the direction of Dr. Bruce W. Smith and with support from the Semiconductor Research Corporation (SRC), DARPA/AFRL, International SEMATECH, ASML, Finle KLA/Tencor, Exitech, Intel, IBM and others.
Recent Papers
- Design correction in extreme ultraviolet lithography
- Alternative optical technologies: more than curiosities
- Design and analysis of a compact EUV interferometric lithography system
- Inverse lithography for 45-nm-node contact holes at 1.35 numerical aperture
- Applications of TM Polarized Illumination
- Analysis of Higher Order Pitch Division for sub-32nm Lithography
From left to right: Peng Xie, Andrew Estroff, Jianming Zhou, Neal Lafferty, Bruce Smith, Bob Frankel, Lena Zavyalova, Anatoly Bourov, Meng Zhao
Nanolithography Research Labs Safety Procedure
