In order to meet material demands of nanotechnology, new classes of material combinations need exploration. We have investigated the UV and VUV optical properties of various metal, oxide, nitride, silicide, and intermetallic thin films and multilayer film stacks for optical and barrier layer applications. Our current efforts remain directed toward finding materials or material combinations whose optical and mechanical properties accommodate nanotechnology and short wavelength nanolithography applications.

Thin films refractive index and extinction coefficient data were obtained by means of spectroscopic ellipsometry combined with spectrophotometry.

Unless noted, all films have been rf magnetron sputtered at thickness of 1000 A or less. Bulk materials appear in italics.

VUV Data

Silicon Carbide, amorphous C, cubic Diamond

37% HCl

Nb₂O₅(r), Al₂O₃(r), Al₂O₃(n)

Mo, MoN, MoOx, Cr₂O₃, CrN, Nb, NbN, Zr, ZrN

Ti, TiN, TiO, Ta, TaN, Ta₂O₅, SiO₂, Si₃N₄

Hf,   HfO₂, HfF₄

BaF₂, GdF, LaF₃, LiF, MgF₂, SrF₂, YF₃, YbF₃

UV/visible data

W, W, WO₃, WN

Mo, MoN

NbN

Zr, ZrO₂, ZrN, ZrF4,

Ta, Ta, Ta₂O₅, TaN, TaSi₂

Cr, CrF₃

Al, Al₂O₃, AlN, Ti

Hf, HfO₂, HfF₄

BaF₂, GdF, LaF₃, LiF, MgF₂, SrF₂, YF₃, YbF₃

Ag Au, Cu, Fe, Mn, Ni, Pd, Pt , Rh, V,

amorphous-Si, crystalline-Si, SiO₂, Si₃N₄

Bulk substrates: soda lime, fused silica, CaF₂, MgF₂, LiF

Pellicle AR high, Pellicle fluoropolymer

Page last updated on April 26, 2012