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| Hyper-NA and Polarization | Mask Induced Polarization Effects at High NA |
High NA and Polarization
B. W. Smith, J. Zhou, P. Xie, "Applications of TM Polarized Illumination" Proc. SPIE 6924, (2008) paper
T. Brist, G. E. Bailey, A. Drozdov, A. Torres, A. Estroff, E. Hendrickx, "Source polarization and OPC effects on illumination optimization" Proc. SPIE 5992, (2005) paper
G. E. Bailey, K. Adam, T. Brist, O. Toublan, A. Estroff, "Reverse engineering source polarization error" Proc. SPIE 5992, (2005) paper
A. Estroff, Y. Fan, A. Bourov, B. Smith, "Mask-induced polarization effects at high numerical aperture" J. Microlith., Microfab., Microsyst. 4 (2005) paper
A. Estroff, Y. Fan, A. Bourov, B.W. Smith, P. Foubert, L.H.A. Leunissen, Y. Aksenov, "Mask Induced Polarization Effects at High NA", Proc. SPIE 5754, (2005) paper
B.W. Smith, L. Zavyalova, A. Estroff, "Benefiting from polarization - effects of high-NA on imaging", Proc. SPIE 5377, (2004) paper | presentation
A. Estroff, Y. Fan, A. Bourov, F. Cropanese, N. Lafferty, L. Zavyalova, B.W. Smith, "Mask induced polarization", Proc. SPIE 5377, (2004) paper | poster
B.W. Smith, J. Cashmore, "Challenges in high NA, polarization, and photoresists", Proc. SPIE 4691, (2002) paper
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Instrumentation Engineers.
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