Bruce Smith Headshot

Bruce Smith

Adjunct Faculty

Distinguished Professor Emeritus
bwsemc@rit.edu
585-475-2058

Bruce Smith

Adjunct Faculty

Distinguished Professor Emeritus

Education

BS, MS, Ph.D., Rochester Institute of Technology

Bio

Professor Bruce Smith has been a member of the engineering faculty at RIT since joining the Microelectronic Engineering program in 1988.  He is currently also the Director of the Microsystems Engineering Ph.D. program. He received B.S., M.S. and Ph.D. degrees from RIT, concentrating on semiconductor technology including thin films, materials, and lithography. Prior to joining the RIT faculty, he held R&D positions in semiconductor engineering at Digital Equipment Corporation in Hudson, MA and AMI Semiconductor in San Jose, CA.  Professor Smith and his group carry out research in areas of micro- and nano-fabrication including nanolithography, semiconductor processing, thin film materials, and optical engineering.  Their work is directed toward leading edge electronic, photonic, micromechanical, and display devices and structures.  Professor Smith is a Fellow of the IEEE, a Fellow of the OSA, a Fellow of SPIE, and a member of AVS and ASEE.

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bwsemc@rit.edu
585-475-2058
Areas of Expertise
Micro-fabrication
Nano-fabrication
Nanolithography
Semiconductor device manufacturing

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Published Conference Proceedings
Smith, Zac Levinson, Andrew Burbine, Erik Verduijn, Obert Wood, Pawitter Mangat, Kenneth Goldberg, Markus Benk, Antoine Wojdyla, Bruce. "Image-based pupil plane characterization via principal component analysis for EUVL tools." Proceedings of the SPIE Advanced Lithography. Ed. NA. San Jose, CA: SPIE, 2016. Print.
Smith, Riaz R Haque, Zac Levinson, Bruce W. "3D mask effects of absorber geometry in EUV lithography systems." Proceedings of the SPIE Advanced Lithography. Ed. NA. San Jose, CA: n.p., 2016. Print.
Smith, Zac Levinson, Jack S Smith, Germain Fenger, Bruce W. "An automated image-based tool for pupil plane characterization of EUVL tools." Proceedings of the SPIE Advanced Lithography. Ed. NA. San Jose, CA: n.p., 2016. Print.
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Invited Article/Publication
Smith, Andreas Erdmann, Rongguang Liang, Apo Sezginer, Bruce. "Advances in Lithography: Special Feature." Applied Optics. (2015). Print.
Journal Paper
Smith, Sudharshanan Raghunathan, Obert R Wood II, Pawitter Mangat, Erik Verduijn, Vicky Philipsen, Eric Hendrickx, Rik Jonckheere, Kenneth A Goldberg, Markus P Benk, Patrick Kearney, Zachary Levinson, Bruce W. "Experimental measurements of telecentricity errors in high-numerical-aperture extreme ultraviolet mask images." Journal of Vacuum Science & Technology B 32. 6 (2015): 06f801. Print.
Baylav, Burak, et al. "Impact of Pupil Plane Filtering on Mask Roughness Transfer." Journal of Vacuum Science & Technology B 31. 6 (2013): 06f801. Print.
Fenger, Germain L, et al. "Extreme Ultraviolet Lithography Resist-based Aberration Metrology." Journal of Micro/Nanolithography, MEMS, and MOEMS 12. 4 (2013): 43001. Print.
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Book Chapter
Smith, Bruce. "Optical projection lithography." Nanolithography: the art of fabricating nanoelectronic and nanophotonic devices and systems. London, UK: Woodhead Publishing, 2014. 1-42. Print.
Smith, Bruce W. "Ch.1. Optical Projection Lithography." Nanolithography: The Art of Fabricating Nanoelectronic and Nanophotonic Devices and Systems. Cambridge, UK: Woodhead Publishing Ltd., 2913. 10-85. Print.
Journal Editor
Smith, Bruce, ed. SPIE Advanced Lithography. Bellingham, WA: SPIE, 2015. Print.
Smith, Bruce, ed. SPIE Advanced Lithography. Bellingham, WA: SPIE, 2016. Print.
Invited Keynote/Presentation
Smith, Bruce. "The influences of illumination throughout optical lithography generations." IMEC Technical Conference. IMEC. Leuven, Belgium. 8 Aug. 2015. Conference Presentation.
Smith, Bruce W. "Lithography Beyond the IC." IMEC Technical Seminar Series. IMEC. Leuven, Belgium. 15 Oct. 2013. Guest Lecture.
Full Patent
Smith, Bruce. "Method of photolithography using a fluid and a system thereof." U.S. Patent 8852850. 7 Oct. 2014.
National/International Competition Award Winner
Smith, Bruce W. Optical Society of America. OSA Fellow. Washington, DC, 2013.
Published Article
Xie, P., and B.W. Smith. “Projection lithography below lambda/7 through deep-ultraviolet evanescent optical imaging.” Journal of Vacuum Science and Technology B, 28.6 (2010): C6Q12-C6Q19. Print. " É *
Telecky, A., P. Xie, J. Stowers, A. Grenville, and B. W. Smith. “Photo-patternable inorganic hardmask.” Journal of Vacuum Science and TechnologyB, 28.6 (2010): C6S19-C6S22. Print." É *
Baylav, B., M. Zhao, R. Yin, P. Xie, C. Scholz, P. Zimmerman, and B.W. Smith. “Alternatives to Chemical Amplification for 193 nm Lithography.” Proceedings of the SPIE - The International Society for Optical Engineering, 7639 (2010): 1-5. Print. " É *
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Currently Teaching

MCEE-505
Lithography Materials and Processes
3 Credits
Microlithography Materials and Processes covers the chemical aspects of microlithography and resist processes. Fundamentals of polymer technology will be addressed and the chemistry of various resist platforms including novolac, styrene, and acrylate systems will be covered. Double patterning materials will also be studied. Topics include the principles of photoresist materials, including polymer synthesis, photochemistry, processing technologies and methods of process optimization. Also advanced lithographic techniques and materials, including multi-layer techniques for BARC, double patterning, TARC, and next generation materials and processes are applied to optical lithography.
MCEE-605
Lithography Materials and Processes
3 Credits
Microlithography Materials and Processes covers the chemical aspects of microlithography and resist processes. Fundamentals of polymer technology will be addressed and the chemistry of various resist platforms including novolac, styrene, and acrylate systems will be covered. Double patterning materials will also be studied. Topics include the principles of photoresist materials, including polymer synthesis, photochemistry, processing technologies and methods of process optimization. Also advanced lithographic techniques and materials, including multi-layer techniques for BARC, double patterning, TARC, and next generation materials and processes are applied to optical lithography. Graduate paper required.

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